Silicon based dielectrics : growth, characterization, and applications in integrated optics
Author(s)
Advisor
Aydınlı, AtillaDate
2005Publisher
Bilkent University
Language
English
Type
ThesisItem Usage Stats
167
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Abstract
In recent years, growing attention has been paid to silicon based dielectrics, such
as silicon oxynitrides, silicon nitrides, and semiconductor doped silicon oxides, all
combined under the name silica on silicon technology. This attention has been
motivated mainly due to their excellent optical properties such as well controlled
refractive index and high transparency over a wide range of wavelength.
In accordance with the main goal of this study that relied on the utilization of
silicon based dielectrics and their optimization for applications in integrated optics,
an emphasis was given to optimize the compositional and optical properties
of these materials. A detailed quantitative compositional analysis using Fourier
transform infrared spectroscopy resulted in identification of the germanosilicate
dielectrics as the most promising candidates for use in integrated optics. The
first reported systematic study of propagation losses for different-index planar
waveguides by using prism coupling method was correlated with the compositional
analysis. This study had an important outcome for planar waveguides
fabricated with germanosilicate core layers resulting in the lowest propagation
loss values reported so far for as deposited CVD-grown films at λ=1.55 µm, eliminating
the need for costly and cumbersome annealing process.
An improvement of the prism coupling technique led to a new approach for
elasto-optic characterization of thin polymer films. This completely new method
allows one to determine the optical anisotropy and out-of-plane mechanical properties
and to correlate both in order to obtain the elasto-optical properties of thin
polymer films, for the first time.
Of interest as potential electro-optic material, we have concentrated on thermally
poled germanosilicate films deposited on fused-silica substrates by PECVD.
As a result of an optimization study, we demonstrated a record peak nonlinear
coefficient of ∼1.6 pm/V, approximately twice as strong as the highest reliable
value reported in a thermally poled fused silica glass.
Finally, we have demonstrated several applications of this technology in the
field of integrated optics. Since optical waveguides constitute the building blocks
of many integrated optical devices, we had first concentrated on design and optimization
of waveguides employing germanosilicates as the core layers. The final
step of our work concentrated on design and implementation of microring resonator
devices based on germanosilicate layers.
Keywords
Integrated opticsSilicon dielectrics
Silicon oxide
Silicon oxynitride
Germanium
Germanosilicate
PECVD
FTIR
Waveguide
Optical absorption
Prism coupling
Elastic modulus
Elasto-optic coefficient
Birefringence
Nonlinearity
Electro-optic coefficient
Thermal poling
Ring resonator
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