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dc.contributor.authorKocabas, A.en_US
dc.contributor.authorAydınlı, Atillaen_US
dc.date.accessioned2016-02-08T10:20:35Z
dc.date.available2016-02-08T10:20:35Z
dc.date.issued2006en_US
dc.identifier.issn10944087
dc.identifier.urihttp://hdl.handle.net/11693/23878
dc.description.abstractWe use the soft lithography technique to fabricate a polymeric waveguide Bragg grating filter. Master grating structure is patterned by e-beam lithography. Using an elastomeric stamp and capillary action, uniform grating structures with very thin residual layers are transferred to the UV curable polymer without the use of an imprint machine. The waveguide layer based on BCB optical polymer is fabricated by conventional optical lithography. This approach provides processing simplicity to fabricate Bragg grating filters. © 2006 Optical Society of America.en_US
dc.language.isoEnglishen_US
dc.source.titleOptics Expressen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/OE.14.010228en_US
dc.subjectCuringen_US
dc.subjectElastomersen_US
dc.subjectElectron beam lithographyen_US
dc.subjectFiber Bragg gratingsen_US
dc.subjectOptical waveguidesen_US
dc.subjectElastomeric stampen_US
dc.subjectGrating structuresen_US
dc.subjectImprint machineen_US
dc.subjectPolymeric waveguide Bragg grating filteren_US
dc.subjectOptical filtersen_US
dc.titlePolymeric waveguide Bragg grating filter using soft lithographyen_US
dc.typeArticleen_US
dc.departmentDepartment of Physicsen_US
dc.citation.spage10228en_US
dc.citation.epage10232en_US
dc.citation.volumeNumber14en_US
dc.citation.issueNumber22en_US
dc.identifier.doi10.1364/OE.14.010228en_US
dc.publisherOptical Society of American (OSA)en_US
dc.contributor.bilkentauthorAydınlı, Atilla


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