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      • Department of Electrical and Electronics Engineering
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      Tunable nano devices fabricated by controlled deposition of gold nanoparticles via focused ion beam

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      Author
      Shahmoon, A.
      Limon, O.
      Girshevitz, O.
      Fleger, Y.
      Demir, Hilmi Volkan
      Zalevsky, Z.
      Date
      2009-12-16
      Source Title
      Microelectronic Engineering
      Print ISSN
      0167-9317
      Publisher
      Elsevier
      Volume
      87
      Issue
      5-8
      Pages
      1363 - 1366
      Language
      English
      Type
      Article
      Item Usage Stats
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      Abstract
      In this paper, we present the fabrication procedures as well as the preliminary experimental results of a novel method for significantly simplified deposition of charged nanoparticles at specific patterns based on focused ion beam (FIB) technology. The deposition method relies on the implantation of positive gallium ions on an insulated material which creates the basis for attracting the nanoparticles to the substrate. In order to substantiate the theory two patterns were generated on a silicon on insulator (SOI) chip with an upper layer of silicon of 200 nm. The two patterns are as follows: resolution target - consisting of six squares and 400 nm × 400 nm circular sinusoidal tunnel. In addition, we demonstrate the utilization and applicability of the aforementioned method in a tunable radiation nano device as well as show its experimental characterization.
      Keywords
      Nanofabrication
      Nanoparticle patterning
      Particle attachment
      Particle deposition
      Permalink
      http://hdl.handle.net/11693/22345
      Published Version (Please cite this version)
      http://dx.doi.org/10.1016/j.mee.2009.12.031
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      • Department of Electrical and Electronics Engineering 3524
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