Frequency dependent electrical characteristics of (Ni/Au)/AlGaN/AlN/GaN heterostructures
Optoelectronics and Advanced Materials-Rapid Communications
Optoelectronica,National Institute of Research and Development for Optoelectronics
859 - 862
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The main electrical parameters such as ideality factor (n), zero bias barrier height (Bo), series resistances (R s), depletion layer width (W D) and interface state densities (N SS) of (Ni/Au)/AlGaN/AlN/GaN heterostructures have been extracted from the current-voltage (I-V) at room temperature, and frequency dependent capacitance voltage (C-V) and conductance-voltage (G/w-V) measurements. The high value of n and R s were attributed to the existence of an interfacial layer (IL) and particular distribution of N ss. The density distrubition profile of N ss was obtained from both forward bias I-V data and low-high frequency (C LF-C HF) measurement methods. In addition, the voltage dependent R s profile obtained both I-V and admittance measurements are in good agreement. As a result, the existence of an IL, R s and N ss lead to deviation from the ideal case of these heterostructures.