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      Two-nanometer laser synthesized Si-nanoparticles for low power memory applications 

      El-Atab, N.; Okyay, Ali Kemal; Nayfeh, A. (Springer International Publishing, 2016)
      Current flash memory devices are expected to face two major challenges in the near future: density and voltage scaling. The density of the memory is related to the gate length scaling which is constrained by the gate stack, ...
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      Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide 

      El-Atab, N.; Turgut, B. B.; Okyay, Ali Kemal; Nayfeh, M.; Nayfeh, A. (Springer New York LLC, 2015)
      In this work, we demonstrate a non-volatile metal-oxide semiconductor (MOS) memory with Quattro-layer graphene nanoplatelets as charge storage layer with asymmetric Al2O3/HfO2 tunnel oxide and we compare it to the ...
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      Memory effect by charging of ultra‐small 2‐nm laser‐synthesized solution processable Si‐nanoparticles embedded in Si–Al2O3–SiO2 structure 

      El-Atab, N.; Rizk, A.; Tekcan, B.; Alkis, S.; Okyay, Ali Kemal; Nayfeh, A. (Wiley-VCH Verlag, 2015)
      A memory structure containing ultra-small 2-nm laser-synthesized silicon nanoparticles is demonstrated. The Si-nanoparticles are embedded between an atomic layer deposited high-κ dielectric Al<inf>2</inf>O<inf>3</inf> layer ...
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      Charge Trapping Memory with 2.85-nm Si-Nanoparticles Embedded in HfO2 

      El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali Kemal; Nayfeh, A. (ECS, 2015-05)
      In this work, the effect of embedding 2.85-nm Si-nanoparticles charge trapping layer in between double layers of high-κ Al<inf>2</inf>O<inf>3</inf>/HfO<inf>2</inf> oxides is studied. Using high frequency (1 MHz) ...
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      Low power Zinc-Oxide based charge trapping memory with embedded silicon nanoparticles 

      Nayfeh, A.; Okyay, Ali Kemal; El-Atab, N.; Özcan, Ayşe; Alkış, Sabri (ECS, 2014)
      In this work, a bottom-gate charge trapping memory device with Zinc-Oxide (ZnO) channel and 2-nm Si nanoparticles (Si-NPs) embedded in ZnO charge trapping layer is demonstrated. The active layers of the memory device are ...
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      Silicon nanoparticle charge trapping memory cell 

      El-Atab, N.; Ozcan, A.; Alkis, S.; Okyay, Ali Kemal; Nayfeh, A. (Wiley-VCH Verlag, 2014)
      A charge trapping memory with 2 nm silicon nanoparticles (Si NPs) is demonstrated. A zinc oxide (ZnO) active layer is deposited by atomic layer deposition (ALD), preceded by Al2O3 which acts as the gate, blocking and ...

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      El-Atab, N. (6)
      Nayfeh, A. (6)Okyay, Ali Kemal (6)Alkis, S. (2)Alkış, Sabri (1)Nayfeh, M. (1)Ozcan, A. (1)Rizk, A. (1)Tekcan, B. (1)Turgut, B. B. (1)... View MoreKeywords
      Nanoparticles (6)
      Atomic layer deposition (5)Charge trapping memory (5)Silicon (5)Silicon nanoparticles (5)Aluminum (4)Charge trapping (4)Charge trapping layers (3)Data storage equipment (3)Digital storage (3)... View MoreDate Issued2015 (3)2014 (2)2016 (1)TypeArticle (3)Conference Paper (2)Book Chapter (1)Has File(s)Yes (6)

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