Browsing by Keywords "Atomic layer deposition"
Now showing items 1-20 of 88
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2-nm laser-synthesized Si nanoparticles for low-power charge trapping memory devices
(IEEE, 2014-08)In this work, the effect of embedding Silicon Nanoparticles (Si-NPs) in ZnO based charge trapping memory devices is studied. Si-NPs are fabricated by laser ablation of a silicon wafer in deionized water followed by sonication ... -
97 percent light absorption in an ultrabroadband frequency range utilizing an ultrathin metal layer: randomly oriented, densely packed dielectric nanowires as an excellent light trapping scaffold
(Royal Society of Chemistry, 2017)In this paper, we propose a facile and large scale compatible design to obtain perfect ultrabroadband light absorption using metal-dielectric core-shell nanowires. The design consists of atomic layer deposited (ALD) Pt ... -
An all-ZnO microbolometer for infrared imaging
(Elsevier BV, 2014)Microbolometers are extensively used for uncooled infrared imaging applications. These imaging units generally employ vanadium oxide or amorphous silicon as the active layer and silicon nitride as the absorber layer. ... -
Amorphous to tetragonal zirconia anostructures and evolution of valence and core regions
(American Chemical Society, 2015)In this report, we study the evolution of valence band (VB) structure during a controlled amorphous to tetragonal transformation of ZrO2 core-shell nanostructures fabricated from electrospun nanofiber template (at 130, ... -
Area-selective atomic layer deposition using an inductively coupled plasma polymerized fluorocarbon layer: A case study for metal oxides
(American Chemical Society, 2016)Area-selective atomic layer deposition (AS-ALD) has attracted immense attention in recent years for self-aligned accurate pattern placement with subnanometer thickness control. Here, we demonstrate a methodology to achieve ... -
Atomic layer deposited Al 2O 3 passivation of type II InAs/GaSb superlattice photodetectors
(AIP, 2012)Taking advantage of the favorable Gibbs free energies, atomic layer deposited (ALD) aluminum oxide (Al 2O 3) was used as a novel approach for passivation of type II InAs/GaSb superlattice (SL) midwave infrared (MWIR) single ... -
Atomic Layer Deposition for Vertically Integrated ZnO Thin Film Transistors: Toward 3D High Packing Density Thin Film Electronics
(Wiley-VCH Verlag, 2017)We report on the first demonstration of the atomic layer deposition (ALD) based three dimensional (3D) integrated ZnO thin film transistors (TFTs) on rigid substrates. Devices exhibit high on-off ratio (∼106) and high ... -
Atomic layer deposition of metal oxides on self-assembled peptide nanofiber templates for fabrication of functional nanomaterials
(Bilkent University, 2016-08)There are mainly two basic approaches in nanostructured materials synthesis. The rst one is the top-down approach and requires material removal from a bulk substrate material by chemical, physical, mechanical or thermal ... -
Atomic layer deposition of NiOOH/Ni(OH) 2 on PIM-1-based N-Doped carbon nanofibers for electrochemical water splitting in alkaline medium
(Wiley‐VCH Verlag GmbH & Co. KGaA, Weinheim, 2019)Portable and flexible energy devices demand lightweight and highly efficient catalytic materials for use in energy devices. An efficient water splitting electrocatalyst is considered an ideal future energy source. Well‐aligned ... -
Atomic layer deposition of Pd nanoparticles on N-Doped electrospun carbon nanofibers: optimization of ORR activity of Pd-Based nanocatalysts by tuning their nanoparticle size and loading
(Wiley-VCHVerlagGmbH& Co. KGaA,Weinheim, 2019)Optimization of size, loading and chemical composition of catalytic nanoparticles is a crucial step to achieve cost‐effective and efficient (electro) catalysts. This report elaborates optimization of palladium (Pd) ... -
Atomic layer deposition of ruthenium nanoparticles on electrospun carbon nanofibers: a highly efficient nanocatalyst for the hydrolytic dehydrogenation of methylamine borane
(American Chemical Society, 2018)We report the fabrication of a novel and highly active nanocatalyst system comprising electrospun carbon nanofiber (CNF)-supported ruthenium nanoparticles (NPs) (Ru@CNF), which can reproducibly be prepared by the ozone-assisted ... -
Atomic layer deposition of zirconium oxide thin film on an optical fiber for cladding light strippers
(TÜBİTAK, 2020)Cladding light strippers are essential components in high-power fiber lasers used for removal of unwanted cladding light that can distort the beam quality or even damage the whole fiber laser system. In this study, an ... -
Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors
(Institute of Physics Publishing, 2017)In this paper, we present the progress in the growth of nanoscale semiconductors grown via atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD became a widespread tool to grow functional ... -
Atomic-layer-deposited zinc oxide as tunable uncooled infrared microbolometer material
(Wiley-VCH Verlag, 2014)ZnO is an attractive material for both electrical and optical applications due to its wide bandgap of 3.37 eV and tunable electrical properties. Here, we investigate the application potential of atomic-layer-deposited ZnO ... -
Capacitance-conductance-current-voltage characteristics of atomic layer deposited Au/Ti/Al2O3/n-GaAs MIS structures
(Elsevier Ltd, 2015)We have studied the admittance and current–voltage characteristics of the Au/Ti/Al2O3/nGaAs structure. The Al2O3 layer of about 5 nm was formed on the n-GaAs by atomic layer deposition. The barrier height (BH) and ideality ... -
Comparison of trimethylgallium and triethylgallium as "ga" source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition
(AVS Science and Technology Society, 2016-02)GaN films grown by hollow cathode plasma-assisted atomic layer deposition using trimethylgallium (TMG) and triethylgallium (TEG) as gallium precursors are compared. Optimized and saturated TMG/TEG pulse widths were used ... -
Cubic-phase zirconia nano-island growth using atomic layer deposition and application in low-power charge-trapping nonvolatile-memory devices
(Institute of Physics Publishing Ltd., 2017)The manipulation of matter at the nanoscale enables the generation of properties in a material that would otherwise be challenging or impossible to realize in the bulk state. Here, we demonstrate growth of zirconia ... -
Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
(A I P Publishing LLC, 2015)Here, we report on the current transport mechanisms in AlN thin films deposited at a low temperature (i.e., 200°C) on p-type Si substrates by plasma-enhanced atomic layer deposition. Structural characterization of the ... -
Demonstration of flexible thin film transistors with GaN channels
(American Institute of Physics Inc., 2016)We report on the thin film transistors (TFTs) with Gallium Nitride (GaN) channels directly fabricated on flexible substrates. GaN thin films are grown by hollow cathode plasma assisted atomic layer deposition (HCPA-ALD) ... -
Design and synthesis of self-assembling peptides for fabrication of functional nanomaterials
(Bilkent University, 2016-12)Self-assembling peptides are a class of supramolecular polymers, which exploit noncovalent interactions such as hydrogen bonding, hydrophobic, electrostatic, charge-transfer complex, π-π, and van der Waals interactions to ...
